Yield Enhancement/Yield Methodologies 3
Session Chairs: Aaron Smith, Victor Chan, Brett Williams
Yield improvement is a primary focus in semiconductor manufacturing. This requires eliminating defects, resolving parametric detractors, addressing design marginalities and correcting systematic problems. In this session, process optimization is discovered and performed for yield, device and reliability improvement on several different technologies.
Thursday, May 16, 2024
8:00AM ET
17.1 Method of Controlling Interface Oxide in Polysilicon Emitter PNP Bipolar Transistors
A. Dineshan, J. Chow, H. Hock Hing, GlobalFoundries
17.2 Improvement on the Gate Oxide Integrity Issue Caused by the Tub Charges in SOI Technology
L. Wong, S. Pilkington, R. Lee, C. A. Tuloi, D. Lau, X-FAB Sarawak
17.3 Surface Leakage of Zener Diode and Its Degradation Behavior Due to Diminishing Field Effect Passivation
K.S.J. Ke, D. Priefert, Infineon Technologies