Yield Enhancement / Yield Methodologies 2
Session Co-Chairs: Larry Pulvirent, SUNY Polytechnic Institute, Alok Vaid
Yield improvement is a primary focus in semiconductor manufacturing. This requires eliminating defects, resolving parametric detractors, addressing design marginalities and correcting systematic problems. In this session, process optimization is discovered and performed for yield, device and reliability improvement on several different technologies.
Wednesday, May 15, 2024
10:55AM ET
11.1 A Case of Plasma-Induced Film Breakdown in 3D NAND BEOL Dielectric Etch
Y. Liang, Y. Chiu, Macronix International; Z. Yang. H. Lee, N. Lian, T. Yang, K. Chen, C. Lu, Macronix International Technology Development Center
11.2 Optimization of FinFET Single Diffusion Break Structure Profile
C. P. Kwan, H. Shen, S. Ashokmani, L. Gao, C. Dineen, V. Vijay, T. Dayanga, C. Sloan, GlobalFoundries
11.3 Double-Edged Effect of Aqueous Hydrofluoric Acid (HF) on Silicon Interface Quality
A. Boo, B. Ng, M. H. Teo, Y. Zhang, K. S. Tan, R. Mondina, C. S. Lee, GlobalFoundries