Yield Enhancement / Yield Methodologies 1
Session Co-Chairs: Ishtiaq Ahsan, Jeff Ye
Yield improvement is a primary focus in semiconductor manufacturing. This requires eliminating defects, resolving parametric detractors, addressing design marginalities and correcting systematic problems. In this session, process optimization is discovered and performed for yield, device and reliability improvement on several different technologies.
Tuesday, May 14, 2024
9:30 AM ET
1.1 Method to Control Polymer Generation During Thick Top Metal Process to Reduce Sidewall Defects
R. Thiruchelvam, S. H. Siraji, B. Cheong, GlobalFoundries
1.2 NVM Tunnel Oxide Integration in an Advanced BCD Node and Its Impact on GOI
G. Liu, M. Lipinski, S. Hose, S. Menon, onsemi
1.3 Copper Electromigration Improvement Through Aluminium Barrier and Related Process Optimization
P. B. Sahoo, H. D. Hadi, A. Afi q, X. Jun, P. Y. Zheng, H. Daiyu, T. T. Hian, C. C. Yee, Globalfoundries