BIOGRAPHY
Dr. Narayanan received his B.Tech. in Metallurgical Engineering from the Indian Institute of Technology, Madras (1995), and his M.S. (1996) and Ph.D. (1999) in Materials Science and Engineering from Carnegie Mellon University. After completing post-doctoral research at Arizona State University, Dr. Narayanan joined the IBM T. J. Watson Research Center in 2001 where he pioneered High-ĸ /Metal Gate Research and Development from the early stages of materials discovery to development and implementation in manufacturing. These High-k /Metal Gate materials form the basis of all IBM systems processors starting with the POWER7+™ server, and of most low-power chips for mobile devices such as smartphones/tablets from Samsung & Apple.
Currently, Dr. Narayanan is an IBM Fellow and Senior Manager at IBM Research where he leads a worldwide IBM team developing Analog In-memory Compute Accelerators for AI applications and novel materials innovation elements for advanced CMOS Logic. Dr. Narayanan is an IEEE Senior Member and was elected a Fellow of the American Physical Society in 2011. He is an author of over 100 journal and conference papers, holds more than 250 patents, and has edited one book: “Thin Films On Silicon: Electronic And Photonic Applications”.