Overview
The IRDS Roadmap has identified near-term challenges related to measurements of particles, trace metals and organics in liquid chemicals at levels required to meet the needs of the industry. The identified challenges are measurement of 10 nm and smaller particles, sub ppt measurement of metallic impurities, measurement of particle precursors and trace organics and online speciation of trace organics. The focus of the workshop will be on recent advances in analytical methodology and instrumentation that will enable the industry to meet these challenges.
Presentation slides
Chemical Quality and Consistency Requirements for the Semiconductor Industry
Analysis of Challenging Semiconductor Chemicals by ICP-MS
Solutions for Near Term Metrology Challenges Identified in IRDS Roadmap
Metrology for Detection of Particle Precursor and Sub-10 nm Particles In Liquids and On-Wafer
Identification of Organic Particle Precursors using FTIR-ATR, SERS and AFM-IR
Access SEMI Standards mentioned in presentations
SEMI C79: Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System
Buy Individual Standard / Purchase a SEMIViews seat to view multiple standards
SEMI C93: Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems
Buy Individual Standard / Purchase a SEMIViews seat to view multiple standards
Join the UPW TF to develop Doc 7284: New Standard: Guide to Evaluate the Efficacy of Particle Precursor Reduction Devices Used in Ultrapure Water (UPW) Systems
Become a SEMI Standards Program Member - Reach out to Laura Nguyen