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The SEMI Award for North America was established in 1979 to recognize enabling technical contributions by individuals and teams to the microelectronics industry. 

For more information about the SEMI Award for North America, please Click here.

YearRecipientContributionArea
2025Lam ResearchFor the development and high-volume production implementation of cryogenic etch technology, enabling the use of novel chemistries to advance high aspect ratio etching in stacked memory manufacturing.
 
Process and Technology Integration
2023Cerebras

Successful implementation of wafer-scale-integration coupled with advanced packaging and system design for Artificial Intelligence (AI) and other Deep-Learning applications as standalone units and in clusters for large-scale data centers.

Process and Technology Integration
2021Everspin TechnologiesDevelopment and first Commercialization of
STT-MRAM Memory

Process and Technology Integration

2020ASMLCommercialization of Extreme
Ultra Violet Lithography
(EUV) Commercialization of Extreme 
Ultra Violet Lithography (EUV)
Manufacturing Process and Process Equipment
2019Waymo (formerly the Google self-driving car project)First Commercialization of Autonomous Vehicles for Public RoadsAutomotive
2018Philip Gadd, IntelDeveloping and producing
the first high volume monolithic photonic transmitting and receiving transceiver.
Process and Technology Integration
2017Bryan Black, PhD, AMDIntegration of the "Fiji" graphics
3D-SiP
Process and Technology Integration
2017MicronDevelopment of the Hybrid
Memory Cube and Co-Founding the Hybrid Memory Cube Consortium
Process and Technology Integration
2015Prof. Chenming Hu, Ph.D.Development of the BSIM
Families of Compact Transistor Model
                      
Process and Technology Integration
2015Alex Lidow, PhD
 
Commercialization of GaN
Power Devices                     
Process and Technology Integration
2014Terry Brewer, Ph.D.,  President, Brewer Science

Invention and commercialization of anti-reflective coatings  used in optical lithography

Dr. Terry Brewer invented an anti-reflective coating that was effective in eliminating reflective interference and provided good adhesion to multiple materials and resist. At the time, anti-reflective coating were a radical approach. Brewer Science, Inc., founded in 1981, developed and commercialized anti-reflective coating materials instrumental in the industry’s progress from g-line to 248nm to 193nm lithography, and now to extreme ultraviolet (EUV) and directed self-assembly (DSA) technology.

Lithography
2014Jason C.S. Chang Chief Executive Officer and Chairman of the Board

Commercialization of copper wire bonds

In the 1980s the semiconductor industry began exploring less costly alternatives for wire bonding. In 2006, Jason Chang and Tien Wu
of ASE committed to underwrite risk, resolve technical problems, and address customer concerns.
In 2007 they started working with materials and equipment vendors to establish a supply chain and also with foundries to establish metallurgy for bonding pads compatible with copper wire bonds. In 2009, Chang and Wu had dramatic results with a few selected customers. By 2013, more than half of ASE production was in copper wire bonds and today it exceeds 70 percent. ASE moved copper wire bonds into volume production and the industry continues to benefit from their efforts.

Assembly and Packaging
2013Dr. Mark Law, University of Florida
Dr. Kevin Jones,University of Florida
Developed a cornerstone of the modern era of computational modeling of CMOS fabrication process with the Florida Object-Oriented Process Simulator (FLOOPS) which was introduced
in 1990. FLOOPS has developed into a widely used, flexible code
for multi-dimensional modeling for advanced IC fabrication processes.
Process and Technology Integration
2013Grigor Gasparyan, Xilinx
Liam Madden, Xilinx
Dr. Steve Trimberger, Xilinx
Suresh Ramalingam, Xilinx
Steve Young, Xilinx
Trevor Bauer, Xilinx
Kumar Nagarajan, Xilinx
(now with Maxim Integrated)
Commercialization of the silicon interposer which provides more than two orders of magnitude increase in die-to-die bandwidth
per watt. This achievement effectively addressed both challenges of decreasing power and increasing bandwidth for advanced digital ICs. It also decreased latency to only 20 percent for standard input/output connections.
Assembly and Packaging
2012Mark Bohr, Intel
Robert Chau, Intel
Suman Datta, Pennsylvania State University (formerly with Intel)
Mark Doczy, Intel
Brian Doyle, Intel
Tahir Ghani, Intel
Jack Kavalieros, Intel
Matthew Metz, Intel
Kaizad Mistry, Intel

The Intel team was honored for their contribution to the first development, integration and introduction of a successful

high-k dielectric and metal electrode gate stack for CMOS IC production, first implemented at the 45nm node in 2007

Process and Technology Integration
2011Moungi Bawendi, MIT professor, QD Vision Science Advisory Board
Vladimir Bulovic, MIT professor, QD Vision Science Advisory Board, QD Vision founder
Seth Coe-Sullivan, QD Vision founder and CTO
John Ritter, QD Vision, EVP of Product Development and Operations
Jonathan S. Steckel, QD Vision founder and director of Chemistry
Commercialization of Quantum
Dot (QD) technology
Materials and Process Integration
2010Thomas DiStefano, Founder, Tessera
John Smith, former CEO, Tessera
Michael Warner, former VP Engineering & Product Development, Tessera
Commercialization of the
uBGA Technology
Advanced Packaging
2009Robert PattiPioneer work in the emerging technical area of 3D IC integrationAssembly and Packaging
2009Andrew Hawryluk
James McWhirter
Michael Thompson
Yun Wang
Annealing using grazing-angle
IR laser beams
Wafer Fabrication
2008Yoshio NishiMemory Development and Visionary R&D ManagementLifetime Achievement
2008Chris Auth
Mark Bohr
Robert Chau
Tahir Ghani
Kaizad Mistry
Anand Murthy
Scott Thompson
Process Integration of Strain-enhanced Mobility Techniques
for CMOS Transistors
Process Integration
2007Bernard S. MeyersonSiGe for Wireless ApplicationLifetime Achievement
2007C. Grant WillsonChemically Amplified ResistLithography
2006Igor KhandrosWafer TestTest Equipment
2005Jim KofordIntegrated Circuit Design and
Test Automation
Lifetime Achievement
 Bob Shillman
Bill Silver
Marilyn Matz
Machine Vision SystemsEnabling Equipment
2004Lee Galbraith George KrenParticle Detection SystemMetrology
2003Arthur EvansBlade Type Fixed-Point Probe
Card
Test Equipment
Chris MackLithography ModelingLithography
2002Richard SpanierMetrologyLifetime Achievement
Tom Hedges
Tom Schaefer
Carl Smith
Roger Sturgeon
Mark Zimmer
Device Design-to-Manufacturing Data Transcription and Data Preparation SoftwareDesign Database
Glenn Tom, Ph.D.
Karl Olander, Ph.D.
Safe Delivery System (SDS)
Gas Storage and Delivery
Materials Technology
2001Robert Knollenberg, Ph.DParticle detection in semiconductor processingMetrology
 Paul Allen, Ph.D.
Hans Buhre
Neil Berglund, Ph.D.
Torbjorn Sandstrom, Ph.D.
Anders Thuren
Paul Warkentin, Ph.D.
Team for Photo mask laser
pattern generation technology
Lithography
2000Doug Scott
John DeBolt
Jonathan Golovin
Team for Manufacturing Execution Systems and Development of PROMIS & COMETSFactory Integration
Anwar ChitayatInnovator and Developer of
the Brushless Linear Motor
Enabling Equipment
1999Anthony Bonora
Mihir Parikh, Ph.D.
Creation and Development of
SMIF
Equipment
1998Bruce Deal, Ph.D.Silicon oxidation technologyLifetime Achievement
William Cote
William Guthrie
Michael Leach
Pioneering development of chemical mechanical planarization processingProcess Technology
1997Peter Rose, Ph.D.Innovator/founder; ion implantation technologyLifetime Achievement
Norman Goldsmith
Werner Kern
"RCA clean"; oxide CVD; BN diffusionProcess Technology
1996Kenneth LevyLeadership in inspection, instrumentation and metrologyLifetime Achievement
Robert Akins Ph.D.
John Bruning
Chris Sparkes
Larry Thompson
Optical tooling and processes
for deep UV lithography
Equipment
Richard BrewerMaterials and process solutions
for Lithography
Materials

1995

 

Vincent CoatesScanning electron microscopeMetrology
Arnon GatRapid thermal processingProcess Equipment
1994Martin HammondLPCVDMaterials Technology
Paul SandlandAutomated wafer inspectionMetrology Equipment
Dan Maydan
David N.K. Wang
Sasson Somekh
Precision 5000Lifetime Achievement
1993Marjorie BalazsYield ImprovementProcess Control
1992Griffith ResorWafer stepper development
for IC Production
Process Equipment
1991Robert Mazur

Automatic spreading

resistance probe

Metrology
1990Charles & Lucia ShipleyPositive photoresistMaterials Technology
1989David PerloffWafer mappingMetrology
Walter RunyanSilicon crystal growthMaterials Technology
1988Douglas PeltzerOxide isolation technologyProcess Technology
Ronald Hershel
Martin Lee
One-to-one wafer stepperProcess Equipment
Dan Maydan
David Wang
Sasson Somekh
Plasma etch standardProcess Equipment
1987Dick Blair
Charles Drexel
Dan LeMay
Mass flow controllerProcess Equipment
Mord WieslerDie bondingAssembly Equipment
Tech Tan
Warren Tice
Intrinsic getteringMaterials Technology
1986Roger Bastide
Peter Rose
Andrew Wittkower
Ion implantation systemsProcess Equipment
C. Arthur LaschAutomatic wafer proberTech. Equipment
Robert WalshChemical-mechanical wafer polishingMaterials Technology
1985Guenter SchwuttkeX-ray topography systemMetrology
Jean HoerniPlanar processProcess Technology
1985Albert SoffaManual and automatic wire bondersAssembly Equipment
1984David Alles
Robert Collier
Donald Harriott
John Stafford
Michael Thomson
Electron beam exposure systemProcess Technology
Neal Stouder

Linear and high/low

temperature test system

Test Equipment
Gordon TealSilicon transistorDevice Technology
1983J. Walter CarlsonSilicon quality standardsMaterials Technology
Kenneth LevyAutomated photomask inspectionMetrology
T. Peter SylvanTest systems developmentTest Equipment
1982Karl A. LangAutomatic diffusion furnacesProcess Equipment
Lawrence MartinsonNegative photoresistMaterials Technology
Lawrence PlummerPlastic device encapsulationAssembly Equipment
1981Robert Grey
David Manson
Wayne Sanborn
Development of silaneMaterial Technology
Burton WheelerPhotorepeating cameraProcess Equipment
Test Systems GroupSentry test equipmentTest Equipment
1980Alfred Barsocchi
Robert Eberly
Donald McKenzie
Alfred Taylor
Commercial doping of gasses and mixturesMaterials Technology
Kazuo MaedaLow pressure CVDProcess Equipment
Matt PenningsUltrasonic wire bonderAssembly Equipment
Sheldon WeinigHigh purity, highly characterized materialsMaterials Technology
1979Walter C. Benzing
Mike McNeilly
Epitaxial silicon depositionProcess Equipment
Jere D. Buckley
Harold Helmstreet
David Markle
Abe Offner
MICRALIGN projection mask alignerProcess Equipment
Frederick W. Kulicke, Jr.Wire bonding and die attachAssembly Equipment
Robert LorenziniSilicon crystal growthMaterials Technology
Nicolas DeWolfeAutomatic semiconductorAssembly Equipment
Henry W. GutscheVapor deposition of polycrystal siliconMaterials Technology
Geoffrey RydingIon implantation equipmentProcess Equipment