Welcome to the Liquid Chemicals Committee Webinar Series
Webinar Topic #1: SEMI Standards Enabling Proactive Yield Management for Advanced Nodes - Particles Control
This webinar describes the SEMI Standards enabling advanced processes contamination control and provides a case study of the use of specific SEMI Standards to address pressing industry needs.
The webinar has been recorded with the goal of assisting semiconductor and supply chain professionals involved in the many aspects of contamination control, including UPW and liquid chemical suppliers dealing with liquid treatment and delivery systems.
Advanced semiconductor manufacturing has reached the current limits of metrology measuring contamination on both the wafers and in the high purity materials. Furthermore, ability of the most advanced filters to control particles in sub-10nm range is also limited. Finally, particle shedding of sub-10nm particles from high-purity components located post-filter cannot be directly measured and only be estimated using power-law extrapolation.
The Liquid Chemical Technical Committee - within the SEMI Standards Program - works closely with the Yield Enhancement IFT - an internationally-focused team within the IRDS - to establish the methodology to enable proactive technology management in the space of contamination control.
Slava Libman is the CEO of FTD Solutions. He has 20+ years of experience in water technology, including engineering, R&D, analytical services, operations, and management, primarily within semiconductor industry. His experience includes different technical and leadership roles with a semiconductor company, major A&E firm, and premier analytical laboratory. He received Ph.D. in Environmental Engineering from the Technion, Israel Institute of Technology. He is a licensed Environmental Engineering Professional. Dr. Libman’s contributions include 50+ publications and conference presentations. He is involved with semiconductor industry activities: co-chairing IRDS Yield Enhancement forum and UPW IRDS team, working on semiconductor water technology roadmap; leading SEMI UPW Task Force, developing UPW and Water management standards for the industry. He is organizing and moderating conferences and seminars, including a lead moderator role with UPM (Ultrapure Micro) Conference.
Gary Van Schooneveld is President of CT Associates, Inc. Gary has 30 years of experience with high-purity fluid systems including chemical delivery and ultrapure water and the development and testing of their associated materials and components. He is the author or co-author of more than 45 technical papers and presentations. Gary is an active member of the IRDS UPW and SEMI UPW Task Forces and has been a key contributor in the development and validation of SEMI specification for measuring filter retention below 15 nm (SEMI C79), particle shedding from critical components (SEMI F104) and extractables ion exchange resin rinse performance. Gary has BS and MS degrees in Materials Engineering from Rensselaer Polytechnic Institute (Troy, NY) and an MBA from the University of Texas (Arlington, TX).
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If you have any questions regarding the SEMI Standards mentioned in this webinar or would like to participate in standards development, please contact:
- Slava Libman, FTD Solutions | email@example.com
- Gary Van Schooneveld, CT Associates, Inc. | firstname.lastname@example.org
- Inna Skvortsova, SEMI | email@example.com
Download the Standards referenced in the Webinar
Please visit SEMI online store to purchase individual standards or subscribe for SEMIViews database for 24/7 online access to 1000+ SEMI Standards.
- SEMI C79 - Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems
- SEMI C93 - Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System
- SEMI F57 - Specification for Polymer Materials and Components Used in Ultrapure Water and Liquid Chemical Distribution Systems
- SEMI F61 - Guide to Design and Operation of a Semiconductor Ultrapure Water System
- SEMI F63 - Guide for Ultrapure Water Used in Semiconductor Processing
- SEMI F75 - Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing
- SEMI F104 - Test Method for Evaluation of Particle Contribution of Components Used in Ultrapure Water and Liquid Chemical Distribution Systems
SEMI Standards development activities take place throughout the year in all major manufacturing regions. To get involved, join the SEMI International Standards Program at: www.semi.org/standardsmembership.