Michael Lercel is SEMATECH's senior director of Nanodefectivity and Metrology. In this role he is responsible for leading both SEMATECH’s Metrology Program and Nanodefect Center, which are dedicated to understanding defect generation processes and developing effective mitigation strategies and solutions to component-level defect challenges.
Prior to joining SEMATECH, Lercel was senior director of EUV product marketing at Cymer, where he was responsible for EUV source product roadmaps. Preceding that, Lercel served in various lithography and process-related positions at IBM for 14 years, most recently as Strategic Equipment Council manager.
While on assignment from IBM, Lercel served as SEMATECH’s director of Lithography from 2005-2008, spearheading the development of various lithography options such as 193 nm high-index immersion, double patterning, and extreme ultraviolet lithography (EUVL), as well as alternative technologies such as nanoimprint and maskless.
Lercel holds a doctorate in physics from Cornell University where he studied nanofabrication on ultra-thin films, as well as a bachelor’s degree in physics from Massachusetts Institute of Technology.