Research Engineer, Silicon Technologies Division, Advanced Materials Deposition Laboratory, CEA-LETI
He received is PhD in 2007 from Lyon 1 University in materials chemistry for his work on metalorganic vapour phase epitaxy growth of B(In)GaAs epilayers. From 2007 to 2009, he worked for the CNRS (French National Center for Scientific Research) and developed coating methods on structured supports for process intensification applications. In 2009, he started his career at CEA (French Alternative Energies and Atomic Energy Commission). First, he worked on the coating and fluidisation of dense powder by fluidized bed metalorganic chemical vapour deposition for the development of new nuclear fuels (2009 – 2011). Then, he developed silica permeation barriers by magnetron sputtering for Laser Megajoule gaseous targets (2011 – 2013). Finally, he joined the CEA-LETI institute. Since 2013, his activity is mainly focused on advanced contact technologies for electronics and photonics applications. He develops contact metallization for advanced CMOS (Si, Ge and III-V channels) and photonics devices and also deals with the surface preparation and interface modulation prior to metallization.
He is the author and co-author of about 40 articles in peer reviewed journals and 70 international conference papers.