Dr. Dennis M. Hausmann
Technical Director - ALD Dielectrics
Dr. Hausmann is Technical Director for ALD Dielectrics at Lam Research and is responsible for new chemistry and processes for dielectric deposition. He has been with Novellus (now Lam Research) for 12 years and has held several technical and managerial roles. His background includes CVD and ALD deposition, chemical precursor design, and inorganic synthesis. He received his Ph.D. in chemistry from Harvard University in the area of precursor and process design for ALD, and received a B.S. in chemistry and B.S. in biology both from the University of California, Irvine.