ASMC 2014 - Tutorial - Directed Self Assembly


Michael A. Guillorn, PhD
Research Staff Member, Manager
Nanofabrication and Electron Beam Lithography
IBM T. J. Watson Research Center


Circuit Relevant Patterning with Directed Self Assembly: Overview and Outlook

This tutorial will begin with a brief summary of the current challenges of 193 nm-based lithography.   An overview of patterning techniques using directed self assembly (DSA) of block copolymers will be presented.  A review of the materials used for DSA along with a survey of critical issues for DSA-based patterning will be discussed including defectively and pattern fidelity.  The tutorial will conclude with a discussion on how DSA-based patterning may be applied to the production of logic and memory circuit patterns.