Research Staff Member, Manager
Circuit Relevant Patterning with Directed Self Assembly: Overview and Outlook
This tutorial will begin with a brief summary of the current challenges of 193 nm-based lithography. An overview of patterning techniques using directed self assembly (DSA) of block copolymers will be presented. A review of the materials used for DSA along with a survey of critical issues for DSA-based patterning will be discussed including defectively and pattern fidelity. The tutorial will conclude with a discussion on how DSA-based patterning may be applied to the production of logic and memory circuit patterns.