Research Staff Member, Manager
Michael Guillorn received a PhD in materials science and engineering from the University of Tennessee, Knoxville in 2003. While performing his PhD research, Michael worked at the Oak Ridge National Laboratory as a staff engineer from 2000 to 2003. In 2003 Michael joined the staff of the Cornell Nanofabrication Facility where he performed research on advanced nanofabrication and lithography techniques. In 2006 Michael joined the IBM TJ Watson Research Center as a research staff member. His current research work involves pushing the limits of CMOS density scaling. In 2010 Michael became the manager of the Electron Beam Lithography and Nanofabrication research group. In 2011 Michael led the team that set the current record for SRAM bitcell density scaling yielding the smallest Si CMOS circuit reported to date. Michael has authored over 70 publications in peer-reviewed journals and holds 35 US patents.