Webinar: Trace Ionic Contamination Monitoring in Semiconductor & Electronics Fabrication
Recorded Webinar: Trace Ionic Contamination Monitoring in Semiconductor & Electronics Fabrication
Recorded Tuesday Oct 8, 2013.
View this informative webinar sponsored by Thermo Fisher Scientific.
High-tech organizations that manufacture semiconductors and electronic products are extremely concerned about contaminants in ultrapure water (UPW) undermining process yield. The required UPW quality exceeds the ability of on-line resistivity measurement to indicate presence of the trace level of impurities, and thus more sensitive lab analysis is required. Another area of concern is acids and bases in air—airborne molecular contamination (AMC)—that requires clean sampling and subsequent low-level analytical testing. High-purity materials may also leach impurities into the process and affect semiconductor manufacturing, especially during the critical period of new system start-up.
Ion chromatography (IC) allows an analyst to determine ionic contamination in UPW, clean-room air, and solid materials. Contamination may come from inorganic anions (such as fluoride, chloride, nitrite, nitrate, and sulfate) or from organic anions (such as acetate, formate, and others). Contamination may also come from positively charged inorganic cations (sodium, ammonium, calcium and magnesium) or from organic compounds, such as amines.
This webinar will first give a brief introduction to the IC analytical method and then focus on how Balazs NanoAnalysis uses IC to deliver the accurate determination of parts per billion (ppb, ug/L) or even parts per trillion (ppt, ng/L) of ionic contaminants for chemistries and materials used in semiconductor and electronic manufacturing processes.
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