450mm Industry News Archive

Return to 450 Central homepage
Return to SEMI homepage

450mm Industry News Archive

2016

Number of IC Manufacturers Using 300mm Wafers Less than Half Using 200mm Wafers (IC Insights; Dec 16, 2016)

Saving Energy in the Fab (SemiEngin; Nov 9, 2016)

450mm focus switches to 300mm, 200mm development (ElecWeekly; Oct 7, 2016)

Wafer Size to Dominated by 300mm and to Continue Increasing Through 2020 (China Times; Oct 7, 2016)

450mm and Other Emergency Measures (SemiEngin; Sept 22, 2016)

450mm: Cleanliness Spec Proposal for Containers (SEMI; Aug 9, 2016)

Mapping the Geographic Reach of 450mm at SEMICON West (F450C; Aug 4, 2016)

Nikon set to start 450mm wafer patterning in Albany (TimesUnion; July 26, 2016)

In the Space of Five Years, It Looks like 450mm Manufacturing Has Become Surplus to Current Requirements (newelectronics; June 28, 2016) 

The Mirage (Elec Weekly; June 17, 2016) 

F450C and G450C Members Meet at SUNY Poly's Albany Site (F450C; May 24, 2016) 

Number of 300mm IC wafer fabs expected to reach 100 in 2016  (SST; Apr 16, 2016)

Number of 300mm IC Wafer Fabs Expected to Reach 100 in 2016 (EMS Now; Apr 15, 2016)

State Budget Plans $60 million to go directly to SUNY Poly Computer Chip Partnership (AlbanyReview; Jan 15, 2016)

2015

SEMICON Europa Part 1; Update on G450 and More (SST; Nov 23)

Infographic on 450mm (F450C; Nov 16)

How About 310mm Wafers? Or 320mm? Or Even 350mm? (ElecWkly, Sept 25)

White Paper: Semiconductor Industry 2015-2025 (section 2) (SEMI/IBS, Aug 4)

F450C Panel Updates Progress at SEMICON West 2015 (F450C, July 23) 

SEMICON Day 3: Leti, Intel Keynote, 450mm (Pic!) and Innovation Keynote (SemiWiki, July 15)

Nikon Announces 450 mm ArF Immersion Scanner at SUNY Polytechnic Institute is Transitioning to Wafer Patterning (Bloomberg, July 9)

450mm Focus Goes West (Elec Weekly, May 28)

Event at upcoming SEMICON West 2015: Update on Industry Status of 450mm

First-of-its-Kind 450mm Immersion Lithography Tool Installed at SUNY Poly's Albany NanoTech Campus(AZNano, Apr 16)

Flexible Facilities for 450mm Facilities (SST, Apr 7)

Notchless Wafer Standard Approved: 450mm Standards Update (SEMI, Mar 2015)

Israeli Consortium to Sign $2.9M Agreement with SUNY Poly CNSE to Develop Critical Tools for Industry Transition to 450mm Technology (SUNY CNSE, Mar 3)

Hidden Costs of Toxic Gas Abatement (F450C, Feb 4)

Enable 450 Newsletter -- (F. Horizons, funded by EC; Jan 2015) 

2014

2013

2012

Return to 450 Central homepage

Return to SEMI homepage