SEMI CGMG Webinar: Patterning Challenges at 5nm

SEMI CGMG Webinar: Patterning Challenges at 5nm

Wednesday, Oct 18, 2017
at 10:00 AM to at 11:00 AM
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Online Webinar, United States


This webinar will focus on materials for patterning at 5nm and beyond, featuring IMEC and JSR.

Sponsored by SEMI Chemical and Gas Manufactures Group

Moore's law is not dead, it is just becoming more challenging.  Traditional lithography scaling is being increasingly supplemented by new processes to reach ever decreasing feature sizes.  These new processes have seen a proliferation of materials and processes designed to meet tomorrow's patterning challenges.  Please join your industry colleagues for this webinar to discuss the patterning challenges that lay ahead for 5nm and beyond and how the semiconductor supply chain is addressing these challenges.  



Agenda

CGMG Overview

Bart Pitcock
VP & GM, KMG Electronic Chemicals, North America

Bart Pitcock is Vice President and General Manager, North America at KMG Electronic Chemicals.  In his role, Mr. Pitcock is responsible for all commercial activities in the region including Sales, Marketing, Technology and Applications Support.  He is also currently serving as Chairman of SEMI’s Chemical and Gas Manufacturers Group (CGMG).  Mr. Pitcock has spent twenty-five years in the semiconductor materials supply industry in roles of increasing responsibility at Ashland Chemical, Air Products and Chemicals, and KMG. 

Introductions

Darron Jurajda
Business Unit Leader, Brewer Science

Darron Jurajda is an expert in materials and process research for anti-reflective materials and multilayer materials and processes for lithography.  He has a diverse background including photolithography, chemical operations and laboratory research.  Darron has published in several technical proceedings and publications, including SPIE, Microlithography Symposium, and Solid State Technology.  He is a member SPIE and a SEMI Texas Committee.  Darron hold a BS in chemical engineering from the University of Texas at Austin.

Patterning Challenges for 5nm

Greg Maclntyre, Director, Advanced Patterning Department, IMEC

Greg McIntyre is responsible for areas related to advanced lithography equipment and process development, metrology and patterning process control, computational lithography, and exploratory patterning materials. Prior to joining IMEC, he was the technical lead for various areas of advanced lithography, imaging and modeling within the IBM research alliance in Albany, New York. He has published over 60 papers, won 7 best paper awards, and has launched a successful startup in the field. Prior to becoming a lithographer, Greg served as a Captain in the US Army. There he held various leadership and management positions, such as directing the logistics for deployment of over 1700 soldiers and development of the US base camps in Kosovo. He holds a Ph.D. and M.S. in electrical engineering from the University of California, Berkeley, and a B.S. from the United States Military Academy at West Point.

A Materials View: How to Address Patterning Challenges

Mark Slezak
Director of Technology and Executive Vice President, JSR Micro, Inc.

Mark Slezak oversees the manufacturing operations, engineering, sales, customer service, and R&D of JSR’s advanced semiconductor materials solutions in the US. Mark is tasked with setting strategies to grow revenue and develop products for key accounts in the US, as well as leveraging the technology influence these accounts have on the global semiconductor materials market.  This includes supporting multinational customers, as well as working to continually improve production systems in the US and guide resources within JSR Corporation’s Semiconductor Operation in Japan. Since 1998, Mark has been involved in the development and commercialization of JSR’s advanced photolithography materials, such as photoresists, SiARC, organic underlayers, anti-reflective coatings, and other supporting materials. Also, Mark oversees JSR’s Packaging & Advanced Cleans materials businesses in the US. Mark has spent time developing new technologies at imec research facility in Europe and at JSR's Japanese R&D center. Mark has his undergraduate degree in Engineering from Cal Poly San Luis Obispo, and has completed Executive Leadership Development course work through Stanford’s Graduate School of Business.


About CGMG

CGMG is the Chemical and Gas Manufacturers Group at SEMI, composed of SEMI member companies who produce, package and / or distribute chemicals or gases used in micro-electronics applications. CGMG promotes awareness of the technical, regulatory and business issues the chemical and gas industry encounters in meeting the expectations of our customers. It plans and sponsors seminars, SEMI exhibits and other events to relevant markets. CGMG serves as a forum for discussing safety and environmental issues. Finally, the group brings a voice to legislation and lobbying efforts on issues our industry faces. More information about CGMG click here.