Our clients can rely on us to widen their sphere of possibilities and reduce their process development times, backed by over 3 decades of expertise in process development for specialty semiconductor markets. We have the capability to process over 200 different materials. Complementary to our process database, we have enlarge our equipment range. Today, we provide both stand-alone modules and production cluster tool for single wafer and multi-wafer batch loading. CORIAL proposes plasma-based technologies including RIE, ICP, DRIE, ICP-CVD, PECVD, and ALE/ALD.