Session 18: Printing Technology
Innovative Roll-to-Roll Equipment and Material Development Suite for Next Generation Technology from Carpe Diem Technologies and the University of Massachusetts Amherst
Thursday, June 22, 2017
9:25 AM - 9:45 AM
This paper presents several of the very latest developments in equipment, process, and materials resulting from the collaboration between Carpe Diem Technologies and the University of Massachusetts, Amherst. Tool developments to be reviewed include the commissioning of a roll-to-roll (R2R) spatial atomic layer deposition tool, a R2R nanoimprint tool capable of patterning polymer, hybrid and inorganic materials, a direct write integrated lithography and interferometry tool and a R2R inkjet printing tool with inline photonic cure. We will also describe innovative materials systems that combined with the tools offer next generation capabilities for printed functional materials and devices. These tools are part of a new, open access, large area print and roll-to-roll manufacturing demonstration facility at UMass Amherst.
John Berg, MSME MIT 1988. John provides the technical and corporate leadership at Carpe Diem Technologies, Inc. which he founded in 2005. Prior to that he was CEO of Aprilis and Fierfly Technologies. He was President and member of the BOD at Zygo now part of Ametek. His experience is repeatedly one of providing technical management and leadership which has resulted in more than 30 patents issued and pending more than half of which are specific to precision semiconductor, thin film and roll to roll applications. Specific technical expertise is in the control and measurement of small structures from microns to nanometers and direct experience in laser machining, diamond turning and most wafer fabrication processes and equipment design. He brings hands-on technical and business experience from start-up to public offerings from 30 years of high tech development and high volume manufacturing.
Carpe Diem Technologies, Inc.