Session 18: Printing Technology
Reverse-offset Printing Process and Equipment for Fine Patterning and Precision Overlay
Thursday, June 22, 2017
8:25 AM - 8:45 AM
For a decade, KIMM has carried out the researches of the reverse-offset printing that focus on how to generate fine patterns with high overlay accuracy in order that the printing process can be applied to the electrodes of large-area display devices. In the early stage of the work, the patterning mechanism was mainly investigated and the process to generate the patterns having the line-width of a few microns was well established. Nowadays, we are focusing on the overlay accuracy of the reverse-offset printing. To investigate the parameters of process and equipment, such as blanket materials, synchronization, printing pressure and position accuracy, on the distortion of the printing positions of the patterns, the finite element (FE) model was developed. At the same time, the first prototype of the printing equipment was developed to verify the FE model by the experiments. As a result, the printing position repeatability of sub-microns in sigma level was obtained in the first prototype by minimizing the effects of variations in process and equipment. Based on the results of the first prototype, we started the researches that can compensate the printing positions of the patterns actively to locate the patterns from the repeated positions to repeated and correct positions. For this purpose, the second prototype of the reverse-offset equipment was developed and the early result of the overlay printing showed that the equipment can provide the reproducible overlay accuracy of 4.1 μm (mean+2sigma level).
Dongwoo Kang (M’79) received B.S, M.S and Ph. D degree from the department of Mechanical Engineering of the Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea, in 2001, 2003 and 2007, respectively. From 2007 to 2011, he was a senior researcher in Photo technology team, Semiconductor division of Samsung electronics, Republic of Korea, where he was working on the application of immersion lithography system. Since 2011, he has been working on developing the precision printing systems and processes for printed electronics.
Korea Institute of Machinery & Materials