North America Standards West 2009 STEPs and WS


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North America Standards STEPs and Workshops at SEMICON West 2009

STEP: Wafer Edge Profile Specifications and Measurements

What:

In many advanced wafer applications, a much tighter specification of the edge profile is required to control variations in subsequent circuit processing. These specifications frequently include values for certain characteristics that describe the segments of the edge profile contour. The relevant parameters used for characterizing the edge profile in more detail than in the past will be discussed in the program as well as the methods used for extracting them from measured edge profiles. These new parameters require a new format for specifying (the edge profile of) wafers, which will also be presented. Finally the importance of accurate edge profile characterization and specification for device processing and the anticipated requirements for future technology generations will be addressed.

When:

July 14, 2009
1:00 PM – 5:00 PM

Where:

San Francisco Marriott Hotel

 
   

SEMI PV Standards – Equipment Performance and Communications

What:

The creation of consistent cross-border standards could revolutionize PV and turn adoption into reality worldwide. SEMI Standards are in a uniqueposition to accelerate appropriate standards activities for the PV industry. A major part of this industry is the equipment used to manufacture components for solar energy.

When:

July 14, 2009
1:30 PM – 5:30 PM

Where:

InterContinental San Francisco Hotel

 
   

Hermetic MEMS Packaging Workshop

What:

This workshop will focus on the newly released SEMI MS8-0309, Guide to Evaluating Hermeticity of MEMS Packages. Furthermore, presentations will focus on leak detection of small volume packages, new designs and procedures enabling evaluation of hermeticity, as well as issues in predicting reliability.

When:

July 14, 2009
2:00 PM – 5:30 PM

Where:

San Francisco Marriott Hotel

 
   

NIST-SEMI Product Authentication Information Management Workshop (PAIM II)

What:

Distinguishing the genuine article from counterfeit is increasingly challenging, and accurate product authentication will require efficient access to information. Based on the discussion held during the first PAIM Workshop at NIST in February several issues are worthy of further discussion. First, understanding the risks associated with counterfeiting is critical to addressing the problem. This includes; the probability of counterfeit parts being used, the consequences of a counterfeit parts being used, and the types and costs of countermeasures. One area that warrants a closer look is obsolescence management as legacy articles are a frequent target for counterfeiters.

When:

July 15, 2009
9:00 AM – 5:30 PM

Where:

San Francisco Marriott Hotel

 
   

SEMI Standards / ISMI Present: e-Manufacturing Workshop

What:

This workshop will provide reports on e-Manufacturing enabling implementations and deployment experiences. Lessons learned from actual implementations will be shared. The latest Interface A, data quality/time synchronization, predictive/preventative maintenance, recipe management, and virtual metrology requirements for our industry will be shared.

This workshop provides an opportunity to further align IC Maker and supplier implementation strategies for the e-Manufacturing suite of requirements.

When:

July 16, 2009
1:00 PM – 5:30 PM

Where:

San Francisco Marriott Hotel

 
   

Schedule at-a-glance:

Programs & Events at SEMICON West 2009

SEMICON West connects you to information, ideas, and solutions driving the business and technology of microelectronics manufacturing - as well as exciting new and expanding opportunities in MEMS, nanoelectronics, solid state lighting, printed electronics, and more.

To learn more about the programs and events offered at SEMICON West, please visit the SEMICON West 2009 microsite.