SEMI Publishes Eight New Technical Standards


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SEMI PUBLISHES EIGHT NEW TECHNICAL STANDARDS

Documents Cover MEMS Terminology, Test Methods for Mechanical Vibration

San Jose, Calif., October 12, 2005 -- SEMI has published eight new technical standards applicable to the semiconductor, flat panel display (FPD) and MEMS manufacturing industries. The new standards, developed by technical experts from equipment suppliers, device manufacturers and other companies participating in the SEMI International Standards Program, are available for purchase in CD-ROM format or can be downloaded from the SEMI website, www.semi.org.

SEMI Standards are published three times a year. The new standards, part of the October 2005 publication cycle, join more than 710 standards that have been published by SEMI during the past 32 years.

The standards include specifications for epitaxial silicon wafers, test methods for measuring mechanical vibrations in FPD handling equipment, MEMS terminologies, and data matrix symbology for automated identification of EUV lithography masks.

“These new specifications will help semiconductor, FPD and MEMS manufacturers reduce production costs and speed time-to-market,” said Bettina Weiss, SEMI director of International Standards. “SEMI is particularly pleased to be able to offer the first set of standard terminologies applicable to the MEMS market.”

The new standards released today include:

D43-1105
Test Method for Mechanical Vibration in AMHS

E142.3-1105
Specification for Web Services for Substrate Mapping

F101-1105
Test Methods for Pressure Regulators used in Gas Distribution Systems

M62-1105
Specifications for Silicon Epitaxial Wafers

P44-1105
Specification for Open Artwork System Interchange Standard (OASIS(TM)) Specific to VSB Mask Writers

PR10-1105
Proposed Specification for RF Air Interface between RFID Tags in Carriers and RFID Readers in Semiconductor Production and Material Handling Equipment

PR11-1105
Terminology for MEMS

T16-1105
Standard for use of Data Matrix symbology for automated identification of Extreme Ultraviolet lithography masks

The SEMI Standards Program, established in 1973, covers all aspects of semiconductor process equipment and materials, from wafer manufacturing to test, assembly and packaging, in addition to the manufacture of flat panel displays and micro-electromechanical systems (MEMS). About 1,100 volunteers worldwide participate in the program, which is made up of 17 global technical committees. Visit www.semi.org/standards for further details about SEMI Standards.

SEMI is a global industry association serving companies that provide equipment, materials and services used to manufacture semiconductors, displays, nano-scaled structures, micro-electromechanical systems (MEMS) and related technologies. SEMI maintains offices in Austin, Beijing, Brussels, Hsinchu, Moscow, San Jose (Calif.), Seoul, Shanghai, Singapore, Tokyo and Washington, D.C. For more information, visit www.semi.org.

ASSOCIATION CONTACTS:

Bettina Weiss/SEMI
Tel: 1.408.943.6998
E-mail: bweiss@semi.org

Jonathan Davis/SEMI
Tel: 1.408.943.6937
E-mail: jdavis@semi.org