Semitool, Inc. Post Ash Ultra Dilute Ammonia Clean Process Wins 2009 SEMICON West Sustainable Technologies Award
SAN FRANCISCO, Calif. – August 20, 2009 – SEMI today announced that Semitool, Inc. is the recipient of the 2009 SEMICON West Sustainable Technologies Award in recognition of their sustainable post ash clean process technology exhibited at SEMICON West, the largest and most influential microelectronics exposition in North America. The SEMICON West 2009 Sustainable Technologies Award winner was selected by the SEMI EHS Division with technical guidance from a panel of high technology industry environmental, health and safety experts representing the academia and research communities and semiconductor device manufacturers. Semitool’s sustainable technology was selected from four finalists, based on an assessment of specific sustainable performance criteria submitted by applicants.
Semitool’s technology, “AOM Replacement of Sulfuric-Based Wet Cleans”, is a single wafer post ash clean process which uses ultra dilute ammonia liquid in conjunction with ozone gas. It replaces sulfuric-peroxide and ammonia-peroxide clean steps, which reduces sulfate containing wastewater emissions. The reduction of sulfuric acid use in a typical semiconductor fab could potentially be thousands of gallons per year, and the reduction of deionized water use could potentially be millions of gallons per year.
“The SEMICON West 2009 Sustainable Technologies Award was created to provide recognition of those SEMICON West exhibitors that demonstrate a commitment to environmental stewardship through the development of sustainable products or services. All of the applicants provided evidence of their attentiveness to improving environmental performance. I congratulate Semitool for winning this inaugural award” said Aaron Zude, Senior Director of SEMI’s EHS Division.
“We are honored to be selected the winner of the Sustainable Technologies Award from SEMICON West 2009, but the real winners are our customers who have implemented this technology into their high-volume production fabs across the globe and are taking full advantage of those benefits,” said Ray Young, General Manager of FEOL Surface Preparation at Semitool Inc. “This sustainable technology not only provides an improved environmental impact for the industry, it also significantly reduces the cost of fab operation. Our thanks go out to SEMI, the awards committee, and our customers.”
SEMI is the global industry association serving the manufacturing supply chains for the microelectronic, display and photovoltaic industries. SEMI member companies are the engine of the future, enabling smarter, faster and more economical products that improve our lives. Since 1970, SEMI has been committed to helping members grow more profitably, create new markets and meet common industry challenges. SEMI maintains offices in Austin, Bangalore, Beijing, Brussels, Hsinchu, Moscow, San Jose, Seoul, Shanghai, Singapore, Tokyo, and Washington, D.C. For more information, visit www.semi.org.
About Semitool, Inc.
Semitool designs, manufactures and supports highly engineered, multi-chamber single wafer and batch wet chemical processing equipment used in the fabrication of semiconductor devices. The company’s primary suites of equipment include surface preparation systems for cleaning, stripping, and etching silicon wafers; electrochemical deposition systems for electroplating copper, gold, solder, and other metals; and wafer transport container cleaning systems. The company’s equipment is used in semiconductor fabrication front-end and back-end processes, including wafer-level packaging and through silicon via. The company’s products also are used in solar cell (PV) production applications.
Headquartered in Kalispell, Montana, Semitool maintains sales and support centers in the United States, Europe, and Asia. The company’s stock trades on the NASDAQ exchange under the symbol SMTL. For more information, please the company’s website at www.semitool.com.
Semitool is a registered trademark of Semitool, Inc.
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