Nissan Chemical Corporation

Nissan Chemical has been providing bottom anti-reflective coating (ARC®*) materials for the microlithography semiconductor manufacturing process and expanding its material technology and business to multi-layer process material as well. Currently, with the adoption of EUV exposure technology (wavelength: 13.5 nm, semiconductor circuit width: 7 to 3 nm), we are promoting the mass production and next-generation development of EUV materials and also focusing on three-dimensional (3D) packaging technology preparing for the limits of optical shrink. * ARC® is registered trademarks of Brewer Science, Inc.